Donna Zhang

Environmental Oxidative Stressors Causing Skin Damage and Carcinogenesis Investigators

Hypochlorous acid (HOCl) is the active oxidizing principle released by standard swimming pool disinfectants used on a global scale, but the health consequences of human exposure inflicted by HOCl (referred to as ‘chlorination stress’) remain largely unknown, posing a major public health concern relevant to populations around the world. Moreover, environmental exposure to solar ultraviolet (UV) radiation is a causative factor in skin photocarcinogenesis.  In an ongoing R21 research project funded by NIEHS since April 2019 (1R21ES029579), Dr. Wondrak, in collaboration with Dr.

Pilot studies examining cinnamon-based Nrf2 activation targeting arsenic-impairment of skin wound healing

The Pilot Project was designed to generate strong preliminary experimental evidence in human skin reconstructs and mouse skin to confirm the feasibility of cutaneous Nrf2 upregulation using topical cinnamaldehyde (CA) and to support CA-based suppression of photocarcinogenesis in a SKH1-Nrf2 wild type mouse model. Data indicate that CA causes a Keap1-C151-dependent increase in the Nrf2 half-life via blockage of ubiquitination with upregulation of a broad panel of cytoprotective Nrf2 target genes and elevation of cellular glutathione.

Donna Zhang, Ph.D.

Donna Zhang, PhD. was a Research Assistant Professor at the University of Missouri at Columbia and was recruited to UA in August 2005. Dr. Lau serves as her faculty mentor. Additionally, Donna is mentored by Drs.

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